| |
|
Seki-ASTeX Main | Products
| Application Notes and Data Sheets
Product
Line
Model
AX5000/5200 + AX6300 (ECR)
Model AX5250/AX5400 (5
kW)
Model AX6550/6560
Model AX6600
Model
AX5010 |
|
|
| Model
AX5000/5200 + ECR (1.5 kW)
The Model AX5000 is a microwave plasma reactor that includes reactor
assembly and microwave related power supply, circulator, dummy load
and three-stub tuner. The Model AX5200 is a complete system combining
the basic reactor AX5000 to vacuum control and process gas supply.
Two optional electromagnets can be used as a divergent files electro
cyclotron resonance (ECR) source for operation at low pressures
and low temperatures. A range of heated and cooled substrate holders
and a choice of ASTeX microwave generators are available.
- High quality
CVD diamond films for a wide variety of applications.
- Flexible
reactor design supports high pressure microwave and magnetized
microwave CVD
- Development
time minimized with supplied CVD diamond process recipes
- Reliable,
stable, reproducible, versatile operation
- Modular approach
to suit a wide range of budgets
- Extensive
after-sales support
|
AX5000 HPM Plasma
Reactor
AX5400 High Growth rate Reactor |
|
| Model
AX5250/AX5400 (5 kW)
The AX5250 microwave plasma reactor incorporates 5 kW at 2.45 GHz
microwave generator to produce plasmas at high power densities.
Such operation allows a new regime of plasma chemistries. In this
microwave cavity configuration, liner growth rates on axis up to
15micro meter mm/hour for diamond have been demonstrated. Total
mass deposition rates of 60mg/hour have been achieved. The process
recipe for thick, high growth rate films is included with the system.
The Model AX5400 is a complete system combining the basic reactor
AX5250 to vacuum control and process gas supply.
- Film or thick
CVD diamond at deposition rates up to 15micro meter mm/hour
- "White"
transparent diamond at growth rates up to 2 to 5micro meter mm/hour
- Accommodates
substrates up to 4 inch diameter
- Produces
CVD diamond with high thermal conductivity - 10 to 20 W/cm-K
- Operation
at 10 to 100 Torr (1 to 100 Torr optional)
- Fully automated
for CVD diamond growth for multi-recipe, multi-day operation
|
AX5200 1.5kW Integration
Model
AX5250 5kW Integration Model |
Comparison
between 1.5kW and 5kW Microwave Diamond CVD
| Microwave
Power |
1.5kW |
5kW |
| Appropriate
applications |
Semiconductor
device (doping), Homo& Hetero epitaxial films, FED* |
Thermo
management (Heat Sink), Optical, Tools coating, FED*, SAW
filters** |
| Typical
Growth rate |
0.1
- 0.5 or 1 micron/hr |
2
- 5 or 6 micron/hr |
| Substrate
Stage |
Heating
Stage |
Water
Cooled Stage |
| Substrate
Temp. Control |
Digital
Setting |
Need
shim replacement |
| BEN*** |
OK |
OK |
| Grain
Size |
Small |
Small
- large |
| Sample
size |
50mm
(2 inch)±15% uniformity (Guaranteed) |
50mm
(2 inch) ±15% uniformity (Guaranteed) |
| Accommodating
substrate |
90mm
(<4 inch) |
100mm
(4 inch) |
| Stage
Option: |
No |
Yes
(changeable to heating stage) |
Field Emission
Display*, Surface Acoustic Wave**, Biased Enhanced Nucleation*** |
|
Model
6550/6560
The AX6550 produces CVD diamond substrates suitable for most heat-spreading
applications. Thick CVD diamond films, to over 2.5 inches in area,
enable and expand applications such as laser diode mounts, multi-chip
modules, surface acoustic wave devices, and high-power GaAs-based
circuits. The AX6550 is designed for a production environment, with
features including: easy loading, push-button operation, low maintenance,
and high uptime. The AX6550's high deposition rates allow relatively
short deposition runs which increase manufacturing flexibility and
response time.
|
AX6500 8kw Semi-Production
Model |
The
AX6560 combines ASTeX's most advanced microwave reactor design and
high growth rate diamond deposition processes into a turnkey system
for pilot production of CVD diamond-coated tool inserts. The AX6560
is designed with the needs of the manufacturing environment in mind,
including easy loading, push-button operation, low maintenance,
and high uptime. In addition, the AX6560 is ideally suited for robotic
tool handing in a production environment.
- Deposits
CVD diamond films at growth rates uniformity necessary for practical,
cost effective tooling applications
- Enables pilot
production of CVD diamond-coated tools
- Provides
a path to full-scale production
- Includes
proprietary process knowledge which significantly shorten the
user's learning curve
- Easy to use
- Available
with extensive after-sales service and support for high reliability
and uptime
Options
- Optical Emission
Spectrometer
- Remote Raman
Spectrometer
- Additional
Gas Channels
- Biasing capabilities
- Temperature
Measurement System
(In-situ nucleation monitoring)
- Turbo Pump
|
|
 |
| Model AX6600
High Power/For Production |
Model
AX6600
The AX6600 microwave plasma system is designed to operate with plasmas
at high power densities for large area, high deposition rate processes
to meet the scale-up needs to diamond coated tool insert manufacturers.
This complete turnkey system incorporates the latest microwave technology
with computer control for ease of use. A large batch size, covering
an area of 8 inches in diameter, can be processed at one time. It
is a highly flexible design which can be operated in a wide range
of power from 35 kW to 100 kW. In
the year 2000, Seki Technotron delivered its first turnkey production
system with 60 kW microwave powered plasma.
- Large throughput
- Easy to use
- Production
capability
- Computer-controlled,
turnkey operation
- Reliable,
stable reproducible,versatile operation
- Extensive
after-sales process support and training
|
Specifications
of different models
| Source
Model |
AX5000 |
AX5400 |
- |
- |
| Integration
Model |
AX5200 |
AX5250 |
- |
- |
| System
Model |
AX6300 |
AX6350 |
AX6550/6560 |
AX6600 |
| Reactor
Type |
Plasma
Immersion |
Plasma
Immersion
|
Plasma
Immersion
|
Plasma
Immersion |
Use
|
R&D |
R&D |
Production |
Production |
| Year
of Initial Sale |
1988 |
1992 |
1993 |
1998 |
| Stage
Heated or Cooled |
Heated |
Cooled |
Cooled |
Cooled |
| Microwave
Power |
1.5kW |
5kW |
8kW |
60
- 100kW |
| Microwave
Frequency |
2.45GHz |
2.45GHz |
2.45GHz |
915MHz |
| Typical
Diameter |
50mm |
50mm |
64mm
dia. Thermal |
200mm |
| |
|
|
100mm
dia. Tools |
|
| Max
Diameter |
100mm |
100mm |
125mm |
300mm |
| Typical
Growth Rate |
0.1-0.5micro
meter g/hr |
up
to 7micro meter m/hr |
up
to 7micro meter m/hr |
up
to 15micro meter m/hr |
| Typical
Mass Rate |
1-4mg/hr |
60mg/hr |
90mg/hr |
1g/hr |
|
|
Model
AX5010 (1.5 kW)
The Model 5010 diamond deposition source is used for the growth of
high quality diamond filmand other materials. Intended as a very low
cost system for basic film research in universities, thesystem nevertheless
produces true polycrystalline diamond films on a variety of substrates
withproperties equal to or better than those made by any other method.
The AX5010 is easy to use,small in size, and gives reproducible results.
The
AX5010 reactor comes complete with a 1.5 kW microwave power generator,
wave-guidecomponents, quartz bell jar, and microwave cavity with
pumping ports, substrate holder, support stand, and air cooling
blower.
- Low cost
reactor - for universities
- Field proven
design - with extensive library of published papers in diamond
- Diamond applications
include: homoepitaxy, doping studies, and selective growth
- Simple construction
- reliable, easy to use andmaintain
- Gas handling
and vacuum kits - for complete CVD diamond configuration
Top
of Page |
Model AX5010 |
|
